Methods of forming capacitor constructions

ABSTRACT

The invention includes constructions having two dielectric layers over a conductively-doped semiconductive material. One of the dielectric layers contains aluminum oxide, and the other contains a metal oxide other than aluminum oxide (such metal oxide can be, for example, one or more of hafnium oxide, tantalum oxide, titanium oxide and zirconium oxide). The layer containing aluminum oxide is between the layer containing metal oxide and the conductively-doped semiconductive material. The invention includes capacitor devices having one electrode containing conductively-doped silicon and another electrode containing one or more metals and/or metal compounds. At least two dielectric layers are formed between the two capacitor electrodes, with one of the dielectric layers containing aluminum oxide and the other containing a metal oxide other than aluminum oxide. The invention also includes methods of forming capacitor constructions.

RELATED PATENT DATA

This patent resulted from a divisional application of U.S. patentapplication Ser. No. 10/822,062, which was filed Apr. 8, 2004, and whichis now U.S. Pat. No. 7,115,929.

TECHNICAL FIELD

The invention pertains to devices comprising aluminum oxide and metaloxide dielectric materials, and in particular aspects pertains tocapacitor constructions. The invention also pertains to methods offorming capacitor constructions.

BACKGROUND OF THE INVENTION

Dielectric materials are utilized in numerous devices associated withsemiconductor constructions, including, for example, capacitors. Acontinuing goal in semiconductor device fabrication is to decrease thefootprint consumed by the devices while maintaining, and preferablyimproving, performance of the devices. In an effort to achieve suchgoal, various new compositions have been developed which can beincorporated into integrated circuit device constructions. It isfrequently challenging to utilize the compositions in semiconductorconstructions, in that the compositions can create undesired andunexpected problems.

In the specific case of capacitor constructions, it is frequentlydesired to utilize a dielectric material having a high dielectricconstant so that a thin layer of the material can provide desiredcapacitance. However, another goal in capacitor device fabrication is toavoid current leakage through a capacitor dielectric material toelectrodes adjacent to the material. It is frequently difficult toaccomplish both goals simultaneously, and it is therefore desired todevelop a dielectric that can address both goals simultaneously.

SUMMARY OF THE INVENTION

In one aspect, the invention includes a device associated with asemiconductor substrate. The device comprises an electrical nodesupported by the semiconductor substrate and containingconductively-doped semiconductive material. The device further includesa first dielectric material comprising aluminum oxide and a seconddielectric material comprising a metal oxide other than aluminum oxide.The first dielectric material is between the second dielectric materialand the conductively-doped semiconductive material.

In one aspect, the invention includes a method of forming a capacitorconstruction. A semiconductor substrate is provided, and a firstcapacitor electrode is formed over the substrate. The first capacitorelectrode comprises conductively-doped silicon. A first dielectric layeris formed over and in physical contact with the conductively-dopedsilicon of the first capacitor electrode. The first dielectric layercomprises aluminum oxide. A second dielectric layer is formed over thefirst dielectric layer. The second dielectric layer comprises a metaloxide other than aluminum oxide. A second capacitor electrode is formedover and in physical contact with the second dielectric layer. Thesecond capacitor electrode comprises one or more metals which can be inelemental form and/or in the form of metal compounds.

BRIEF DESCRIPTION OF THE DRAWINGS

Preferred embodiments of the invention are described below withreference to the following accompanying drawings.

FIG. 1 is a diagrammatic, cross-sectional view of a semiconductor waferfragment illustrating an exemplary device of an aspect of the presentinvention.

FIG. 2 is a diagrammatic, cross-sectional view of a portion of the FIG.1 device shown at a preliminary processing stage of an exemplary aspectof the present invention.

FIG. 3 is a view of the FIG. 2 portion shown at a processing stagesubsequent to that of FIG. 2.

FIG. 4 is a view of the FIG. 2 portion shown at a processing stagesubsequent to that of FIG. 3.

FIG. 5 is a view of the FIG. 2 portion shown at a processing stagesubsequent to that of FIG. 4.

FIG. 6 is a diagrammatic, cross-sectional view of a semiconductor deviceillustrating an exemplary aspect of the invention alternative to that ofFIG. 1.

FIG. 7 is a diagrammatic view of a computer illustrating an exemplaryapplication of the present invention.

FIG. 8 is a block diagram showing particular features of the motherboardof the FIG. 7 computer.

FIG. 9 is a high-level block diagram of an electronic system accordingto an exemplary aspect of the present invention.

FIG. 10 is a simplified block diagram of an exemplary memory deviceaccording to an aspect of the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

This disclosure of the invention is submitted in furtherance of theconstitutional purposes of the U.S. Patent Laws “to promote the progressof science and useful art” (Article 1, Section 8).

Among the compositions which have been developed for utilization ascapacitor dielectric materials are metal oxides, such as, for example,aluminum oxide, hafnium oxide, titanium oxide, zirconium oxide andtantalum oxide. Hafnium oxide, tantalum oxide and zirconium oxide can beparticularly desired, in that such oxides have relatively highdielectric constants. However, one aspect of the invention is arecognition that if hafnium oxide, tantalum oxide and/or zirconium oxideis provided directly against a conductively-doped semiconductor material(such as, for example, conductively-doped silicon), current leakage canoccur between the dielectric material and the conductively-dopedsemiconductor material. If an appropriate intervening (barrier) materialis provided between the conductively-doped semiconductor material andthe dielectric material comprising hafnium oxide, tantalum oxide and/orzirconium oxide, the leakage current can be reduced.

One aspect of the invention is a recognition that an appropriatematerial to provide between the conductively-doped semiconductivematerial and the dielectric comprising hafnium oxide, tantalum oxide,and/or zirconium oxide is aluminum oxide. Even though aluminum oxide hasa dielectric constant less than that of hafnium oxide, tantalum oxideand zirconium oxide, and therefore can be less desired than hafniumoxide, tantalum oxide and zirconium oxide in applications in which highdielectric constants are desired (such as, for example, capacitorapplications), the aluminum oxide has the desired property of reducingleakage to the conductively-doped semiconductive material.

As a specific example, hafnium oxide has a higher dielectric constant(about 22) than aluminum oxide (about 9). However, the thermal stabilityof hafnium oxide is not as good as aluminum oxide, and also the leakageis higher for hafnium oxide compared to aluminum oxide. One aspect ofthe invention is to take advantage of the higher dielectric constant ofhafnium oxide and the lower leakage of aluminum oxide by utilizinglaminates of aluminum oxide and hafnium oxide to decrease the leakageand increase the hafnium oxide thermal stability. The laminates arealuminum oxide/hafnium oxide bilayers rather than trilayers or othermultilayer stacks. An aluminum oxide/hafnium oxide bilayer can be moredesirable as a dielectric material than a multilayer stack because thefabrication of the bilayer is simpler.

An exemplary aspect of the invention is described with reference to asemiconductor construction 10 in FIG. 1. Construction 10 comprises asemiconductor substrate 12 which can be, in particular aspects of theinvention, monocrystalline silicon lightly-doped with background p-typedopant. To aid in interpretation of the claims that follow, the terms“semiconductive substrate” and “semiconductor substrate” are defined tomean any construction comprising semiconductive material, including, butnot limited to, bulk semiconductive materials such as a semiconductivewafer (either alone or in assemblies comprising other materialsthereon), and semiconductive material layers (either alone or inassemblies comprising other materials). The term “substrate” refers toany supporting structure, including, but not limited to, thesemiconductive substrates described above.

A pair of wordlines 14 and 16 extend over substrate 12. Each of thewordlines comprises an electrically insulating gate dielectric 18, anelectrically conductive line 20, and an electrically insulating cap 22.Materials 18, 20 and 22 can comprise any suitable materials. Typically,dielectric material 18 would comprise silicon dioxide, conductivematerial 20 would comprise one or more of conductively-doped silicon,metal, and metal compounds; and insulative cap would comprise siliconnitride. The layers 18, 20 and 22 can be single layers (as shown), orcan comprise stacks of layers having appropriate conductivity. Forinstance, the conductive lines 20 would frequently comprise stacks ofconductive layers, such as, for example, stacks containing a layer ofconductively-doped silicon, a layer of metal, and a layer of metalcompound (such as, for example, metal silicide).

Each of the wordlines 14 and 16 has vertically extending sidewalls, andhas sidewall spacers 24 formed along the sidewalls. Sidewall spacers 24comprise anisotropically-etched insulative material, and can, forexample, comprise silicon nitride.

Wordline 16 comprises a transistor gate in the shown construction.Source/drain regions 26 and 28 extend into substrate 12 proximate thegate. The source/drain regions are conductively-doped regions ofsubstrate 12, and can comprise p-type doped regions or n-type dopedregions as known to persons of ordinary skill in the art.

An isolation region 30 is beneath wordline 14, and electrically isolateswordline 14 from source/drain region 26.

An electrically conductive pedestal 32 is provided over source/drainregion 26 and in electrical connection with source/drain region 26.Pedestal 32 can comprise any suitable electrically conductive material,or combination of materials, including, for example, metals, metalcompounds, and conductively-doped semiconductive materials (such as, forexample, conductively-doped silicon).

An electrically conductive material 34 extends over and in electricalconnection with conductive pedestal 32. Conductive material 34 cancomprise the same composition as at least a portion of pedestal 32, orcan comprise a different composition. Conductive material 34 cancomprise conductively-doped semiconductive material. Theconductively-doped semiconductive material can comprise, consistessentially of, or consist of conductively-doped silicon, such as, forexample, conductively-doped polycrystalline silicon, conductively-dopedamorphous silicon, and/or conductively-doped monocrystalline silicon.

Conductive material 34 can be considered to be an electrical nodesupported by substrate 12. Alternatively, conductive regions 26, 32 and34 can together be considered to be an electrical node supported bysubstrate 12, or conductive regions 32 and 34 can be considered to be anelectrical node.

A first dielectric material 36 is provided over conductive material 34.Dielectric material 36 comprises, consists essentially of, or consistsof aluminum oxide.

A second dielectric material 38 is formed over the first dielectricmaterial 36. Second dielectric material 38 comprises a metal oxide otherthan aluminum oxide, and can comprise, for example, a metal oxideselected from the group consisting of hafnium oxide, tantalum oxide andzirconium oxide. In particular aspects, dielectric material 38 cancomprise, consist essentially of, or consist of one or more of hafniumoxide, tantalum oxide and zirconium oxide.

In some aspects, the second dielectric material comprises a stack ofdielectric materials, such as, for example, a stack of tantalum oxideand hafnium oxide, or a stack of zirconium oxide and hafnium oxide.Materials 36 and 38 can thus be together incorporated into a stackcomprising, in sequential order, aluminum oxide, tantalum oxide andhafnium oxide (i.e., Al₂O₃/Ta₂O₅/HfO₂); or aluminum oxide, zirconiumoxide and hafnium oxide (i.e., Al₂O₃/ZrO₂/HfO₂).

The layers 36 and 38 can be repeated multiple times to form, forexample, a stack comprising aluminum oxide, hafnium oxide, aluminumoxide and hafnium oxide (i.e., Al₂O₃/HfO₂/AI₂O₃/HfO₂).

Dielectric material 36 can be formed to a thickness of, for example,from about 5 Å to about 60 Å, and in some aspects can be formed to athickness of, for example, from about 5 Å to about 20 Å. Dielectricmaterial 38 can have a thickness of, for example, from about 20 Å toabout 90 Å, and in some aspects can be formed to a thickness of, forexample, from about 20 Å to about 60 Å. A combined thickness of layers36 and 38 can be, for example, from about 25 Å to about 150 Å, and inparticular aspects the combined thickness will be from about 25Å toabout 80 Å.

In the shown aspect of the invention, layer 36 is physically in contactwith conductive material 34, and is also physically in contact with thedielectric material 38. In other words, first dielectric material 36comprises a pair of opposing surfaces, with one of the opposing surfacesbeing physically against the conductively-doped semiconductive materialof layer 34, and the other being physically against the metal oxide ofsecond dielectric layer 38.

A conductive material 40 is formed over and in physical contact withsecond dielectric layer 38. Conductive material 40 can comprise one ormore metals, and in particular aspects of the invention will comprise ametal compound, such as, for example, a metal nitride. Layer 40 can, forexample, comprise, consist essentially of, or consist of titaniumnitride.

A second conductive material 42 is formed over conductive material 40.Second conductive material 42 can comprise an appropriate metal, metalcompound, and/or conductively-doped semiconductor material. Inparticular aspects of the invention, layer 42 will comprise, consistessentially of, or consist of tungsten. In other aspects, layer 42 willcomprise a layer of conductively-doped silicon and a layer of tungsten,with the conductively-doped silicon being between the tungsten and ametal nitride (such as titanium nitride) of layer 40.

Layers 32, 34, 36, 38, 40 and 42 together form a capacitor construction44. Specifically, conductive materials 32 and 34 form a first capacitorelectrode, conductive materials 40 and 42 form a second capacitorelectrode, and dielectric materials 36 and 38 separate the first andsecond capacitor electrodes from one another.

Capacitor 44 is electrically connected to the source/drain region 26,and is thus connected to one of the source/drain regions of a transistorconstruction. The other source/drain region 28 of the transistorconstruction is electrically connected with a bitline 46. Capacitor 44can be utilized as a memory storage device of a dynamic random accessmemory (DRAM) cell and can be accessed through wordline 16 and bitline46. A plurality of DRAM cells of the type described in FIG. 1 can beutilized together as a DRAM array.

The construction of FIG. 1 is but one of many constructions that can beformed in accordance with aspects of the present invention. The showncapacitor is an exemplary capacitor, and it is to be understood that thecapacitor can be formed in numerous other shapes. Also, it is to beunderstood that even though the shown capacitor only comprises twodielectric layers between the first and second capacitor electrodes, theinvention encompasses other aspects (described below with reference toFIG. 6) in which multiple dielectric materials are provided betweenfirst and second capacitor electrodes. Also, even though the inventionis described with reference to formation of capacitor structures, it isto be understood that various aspects of the invention can be utilizedin other constructions besides capacitor structures.

A method of forming the capacitor construction of FIG. 1 is describedwith reference to FIGS. 2-5. Referring initially to FIG. 2, thecapacitor electrode 34 of construction 10 is illustrated at apreliminary processing stage. The capacitor electrode 34 is shown inisolation in FIG. 2, rather than in combination with the otherstructures of FIG. 1, to simplify the drawing. It is to be understood,however, that the electrode can be supported by the semiconductorsubstrate 12 described above with reference to FIG. 1.

First capacitor electrode 34 comprises an upper surface 35 containingconductively-doped semiconductive material. In particular aspects, theupper surface will comprise, consist essentially of, or consist ofconductively-doped silicon.

Referring to FIG. 3, the first dielectric layer 36 is formed overcapacitor electrode 34, and specifically is formed in physical contactwith upper surface 35 of the capacitor electrode. First dielectricmaterial 36 comprises, consists essentially of, or consists of aluminumoxide, and can be formed by, for example, chemical vapor deposition(CVD) and/or atomic layer deposition (ALD).

Referring to FIG. 4, the second dielectric layer 38 is formed over thefirst dielectric layer 36. Second dielectric layer 38 can comprise,consist essentially of, or consist of one or more of hafnium oxide,tantalum oxide and zirconium oxide. Second dielectric material 38 can beformed utilizing CVD and/or ALD.

In particular aspects of the invention, layers 36 and 38 are formed in adeposition process utilizing a common deposition chamber, and withoutbreaking vacuum to the chamber between the deposition of firstdielectric layer 36 and the deposition of the second dielectric layer38. In other aspects of the invention, layers 36 and 38 are formed inseparate deposition processes, and specifically, a vacuum to a chamberutilized for forming first dielectric layer 36 is broken prior toforming second dielectric layer 38.

Referring to FIG. 5, the conductive materials 40 and 42 are formed oversecond dielectric layer 38. Such can be accomplished by, for example,utilizing one or more of ALD, CVD and physical vapor deposition (PVD)

The structures shown thus far have utilized layers 36 and 38 as the onlydielectric materials between a first capacitor electrode and a secondcapacitor electrode. FIG. 6 illustrates another aspect of the invention,and specifically shows a structure 60 in which dielectric materials 50and 52 are included between capacitor electrodes 34 and 40 in additionto the above-discussed dielectric materials 36 and 38. It is desiredthat the dielectric material 36 containing aluminum oxide is in physicalcontact with capacitor electrode 34.

FIG. 6 shows that additional dielectric materials can be providedbetween metal oxide-containing dielectric material 38 and aluminumoxide-containing dielectric material 36. In particular aspects of theinvention, the various dielectric layers can comprise repeating stacksof an aluminum oxide-containing layer and a layer containing one or moreof hafnium oxide, tantalum oxide and zirconium oxide. For instance,layer 50 can have the same composition as layer 38, and layer 52 canhave the same composition as layer 36. Layers 50 and 52 can, in otheraspects of the invention, comprise entirely different dielectricmaterials than those utilized in layers 36 and 38. The invention cancomprise any desired number of dielectric layers in addition to layers36 and 38, and the additional layers can have any suitable compositionto achieve a desired thickness and/or capacitance.

Although layer 38 is shown in physical contact with conductive layer 40of the second capacitor electrode in the aspects of the invention shownin the accompanying figures, it is to be understood that layer 38 can bespaced from the capacitor electrode by other dielectric materials invarious aspects of the invention (not shown).

FIG. 7 illustrates generally, by way of example but not by way oflimitation, an embodiment of a computer system 400 according to anaspect of the present invention. Computer system 400 includes a monitor401 or other communication output device, a keyboard 402 or othercommunication input device, and a motherboard 404. Motherboard 404 cancarry a microprocessor 406 or other data processing unit, and at leastone memory device 408. Memory device 408 can comprise various aspects ofthe invention described above. Memory device 408 can comprise an arrayof memory cells, and such array can be coupled with addressing circuitryfor accessing individual memory cells in the array. Further, the memorycell array can be coupled to a read circuit for reading data from thememory cells. The addressing and read circuitry can be utilized forconveying information between memory device 408 and processor 406. Suchis illustrated in the block diagram of the motherboard 404 shown in FIG.8. In such block diagram, the addressing circuitry is illustrated as 410and the read circuitry is illustrated as 412. Various components ofcomputer system 400, including processor 406, can comprise one or moreof the memory constructions described previously in this disclosure.

Processor device 406 can correspond to a processor module, andassociated memory utilized with the module can comprise teachings of thepresent invention.

Memory device 408 can correspond to a memory module. For example, singlein-line memory modules (SIMMs) and dual in-line memory modules (DIMMs)may be used in the implementation which utilize the teachings of thepresent invention. The memory device can be incorporated into any of avariety of designs which provide different methods of reading from andwriting to memory cells of the device. One such method is the page modeoperation. Page mode operations in a DRAM are defined by the method ofaccessing a row of a memory cell arrays and randomly accessing differentcolumns of the array. Data stored at the row and column intersection canbe read and output while that column is accessed.

An alternate type of device is the extended data output (EDO) memorywhich allows data stored at a memory array address to be available asoutput after the addressed column has been closed. This memory canincrease some communication speeds by allowing shorter access signalswithout reducing the time in which memory output data is available on amemory bus. Other alternative types of devices include SDRAM, DDR SDRAM,SLDRAM, VRAM and Direct RDRAM, as well as others such as SRAM or Flashmemories.

Memory device 408 can comprise memory formed in accordance with one ormore aspects of the present invention.

FIG. 9 illustrates a simplified block diagram of a high-levelorganization of various embodiments of an exemplary electronic system700 of the present invention. System 700 can correspond to, for example,a computer system, a process control system, or any other system thatemploys a processor and associated memory. Electronic system 700 hasfunctional elements, including a processor or arithmetic/logic unit(ALU) 702, a control unit 704, a memory device unit 706 and aninput/output (I/O) device 708. Generally, electronic system 700 willhave a native set of instructions that specify operations to beperformed on data by the processor 702 and other interactions betweenthe processor 702, the memory device unit 706 and the I/O devices 708.The control unit 704 coordinates all operations of the processor 702,the memory device 706 and the I/O devices 708 by continuously cyclingthrough a set of operations that cause instructions to be fetched fromthe memory device 706 and executed. In various embodiments, the memorydevice 706 includes, but is not limited to, random access memory (RAM)devices, read-only memory (ROM) devices, and peripheral devices such asa floppy disk drive and a compact disk CD-ROM drive. One of ordinaryskill in the art will understand, upon reading and comprehending thisdisclosure, that any of the illustrated electrical components arecapable of being fabricated to include memory constructions inaccordance with various aspects of the present invention.

FIG. 10 is a simplified block diagram of a high-level organization ofvarious embodiments of an exemplary electronic system 800. The system800 includes a memory device 802 that has an array of memory cells 804,address decoder 806, row access circuitry 808, column access circuitry810, read/write control circuitry 812 for controlling operations, andinput/output circuitry 814. The memory device 802 further includes powercircuitry 816, and sensors 820, such as current sensors for determiningwhether a memory cell is in a low-threshold conducting state or in ahigh-threshold non-conducting state. The illustrated power circuitry 816includes power supply circuitry 880, circuitry 882 for providing areference voltage, circuitry 884 for providing the first wordline withpulses, circuitry 886 for providing the second wordline with pulses, andcircuitry 888 for providing the bitline with pulses. The system 800 alsoincludes a processor 822, or memory controller for memory accessing.

The memory device 802 receives control signals 824 from the processor822 over wiring or metallization lines. The memory device 802 is used tostore data which is accessed via I/O lines. It will be appreciated bythose skilled in the art that additional circuitry and control signalscan be provided, and that the memory device 802 has been simplified tohelp focus on the invention. At least one of the processor 822 or memorydevice 802 can include a memory construction of the type describedpreviously in this disclosure.

The various illustrated systems of this disclosure are intended toprovide a general understanding of various applications for thecircuitry and structures of the present invention, and are not intendedto serve as a complete description of all the elements and features ofan electronic system using memory cells in accordance with aspects ofthe present invention. One of the ordinary skill in the art willunderstand that the various electronic systems can be fabricated insingle-package processing units, or even on a single semiconductor chip,in order to reduce the communication time between the processor and thememory device(s).

Applications for memory cells can include electronic systems for use inmemory modules, device drivers, power modules, communication modems,processor modules, and application-specific modules, and may includemultilayer, multichip modules. Such circuitry can further be asubcomponent of a variety of electronic systems, such as a clock, atelevision, a cell phone, a personal computer, an automobile, anindustrial control system, an aircraft, and others.

It is noted that relative elevational relationships are utilized todescribe the locations of various features to one another (e.g., upward,downward, etc are utilized) within this disclosure. It is to beunderstood that such terms are used to express relative relationsbetween the components only, and not to indicate a relationship of thecomponents relative to an external frame of reference. Thus, forexample, a feature described herein as projecting upwardly relative toanother feature may in fact appear to extend downwardly to a viewer inan external frame of reference relative to the feature.

In compliance with the statute, the invention has been described inlanguage more or less specific as to structural and methodical features.It is to be understood, however, that the invention is not limited tothe specific features shown and described, since the means hereindisclosed comprise preferred forms of putting the invention into effect.The invention is, therefore, claimed in any of its forms ormodifications within the proper scope of the appended claimsappropriately interpreted in accordance with the doctrine ofequivalents.

1. A method of forming a capacitor construction, comprising: providing asemiconductor substrate; forming a first capacitor electrode over thesubstrate, the first capacitor electrode comprising conductively-dopedsilicon; forming a first dielectric layer over and in physical contactwith the conductively-doped silicon of the first capacitor electrode,the first dielectric layer consisting of aluminum oxide; forming asecond dielectric layer over the first dielectric layer, the seconddielectric layer consisting of a metal oxide selected from the groupconsisting of hafnium oxide, tantalum oxide and zirconium oxide; andforming a second capacitor electrode having a surface over and inphysical contact with the hafnium oxide, tantalum oxide or zirconiumoxide of the second dielectric layer, the surface of the secondcapacitor electrode consisting of metal nitride; the first and secondcapacitor electrodes, and the first and second dielectric materials,together being incorporated into a capacitor construction.
 2. The methodof claim 1 wherein the first and second dielectric materials areincorporated into a stack comprising aluminum oxide and hafnium oxide.3. The method of claim 1 wherein the first and second dielectricmaterials are incorporated into a stack comprising, in sequential orderwithin the stack, aluminum oxide, tantalum oxide and hafnium oxide. 4.The method of claim 1 wherein the first and second dielectric materialsare incorporated into a stack comprising, in sequential order within thestack, aluminum oxide, zirconium oxide and hafnium oxide.
 5. The methodof claim 1 wherein the first and second dielectric materials areincorporated into a stack comprising, in sequential order within thestack, aluminum oxide, hafnium oxide, aluminum oxide and hafnium oxide.6. The method of claim 1 further comprising forming at least oneadditional dielectric layer over the first dielectric layer beforeforming the second dielectric layer.
 7. The method of claim 1 whereinthe second dielectric layer is formed to be in physical contact with thefirst dielectric layer.
 8. The method of claim 7 wherein the forming ofthe first and second dielectric layers comprises deposition of the firstand second dielectric layers using a deposition chamber and withoutbreaking vacuum to the chamber between the deposition of the firstdielectric layer and the deposition of the second dielectric layer. 9.The method of claim 7 wherein the forming of the first and seconddielectric layers comprises deposition of the first and seconddielectric layers using a deposition chamber and with breaking vacuum tothe chamber between the deposition of the first dielectric layer and thedeposition of the second dielectric layer.
 10. The method of claim 7wherein the first and second dielectric layers are formed to have acombined thickness of from about 25Å to about 80Å.
 11. The method ofclaim 10 wherein the first dielectric layer is formed to have athickness of from about 5Å to about 20Å.
 12. The method of claim 10wherein the second dielectric layer is formed to have a thickness offrom about 20Å to about 60Å.
 13. The method of claim 1 wherein thesecond dielectric layer is formed to consist of hafnium oxide.
 14. Themethod of claim 1 wherein the second dielectric layer is formed toconsist of tantalum oxide.
 15. The method of claim 1 wherein the seconddielectric layer is formed to consist of zirconium oxide.
 16. A methodof forming a capacitor construction, comprising: forming a firstcapacitor electrode comprising conductively-doped silicon; forming afirst layer over and directly against the conductively-doped silicon ofthe first capacitor electrode, the first layer consisting of aluminumoxide; forming a second layer over and directly against the first layer,the second layer consisting of one or more of hafnium oxide, tantalumoxide and zirconium oxide; forming a third layer over and directlyagainst the second layer, the third layer consisting of aluminum oxide;forming a fourth layer over and directly against the third layer, thefourth layer consisting of one or more of hafnium oxide, tantalum oxideand zirconium oxide; and forming a second capacitor electrode having asurface over and in direct contact with at least one of the hafniumoxide, tantalum oxide and zirconium oxide of the fourth layer, thesurface of the second capacitor electrode consisting of metal nitride.